Influence of thermal annealing on microstructural, morphological, optical properties and surface electronic structure of copper oxide thin films

Basit Öğe Kaydı
dc.authorid0000-0003-3667-179X
dc.contributor.authorAkgul, Funda Aksoy
dc.contributor.authorAkgul, Guvenc
dc.contributor.authorYildirim, Nurcan
dc.contributor.authorUnalan, Husnu Emrah
dc.contributor.authorTuran, Rasit
dc.date.accessioned2019-08-01T13:38:39Z
dc.date.available2019-08-01T13:38:39Z
dc.date.issued2014
dc.departmentNiğde ÖHÜ
dc.description.abstractIn this study, effect of the post-deposition thermal annealing on copper oxide thin films has been systemically investigated. The copper oxide thin films were chemically deposited on glass substrates by spin-coating. Samples were annealed in air at atmospheric pressure and at different temperatures ranging from 200 to 600 degrees C. The microstructural, morphological, optical properties and surface electronic structure of the thin films have been studied by diagnostic techniques such as X-ray diffraction (XRD), Raman spectroscopy, ultraviolet-visible (UV-VIS) absorption spectroscopy, field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The thickness of the films was about 520 nm. Crystallinity and grain size was found to improve with annealing temperature. The optical bandgap of the samples was found to be in between 1.93 and 2.08 eV. Cupric oxide (Cuo), cuprous oxide (Cu2O) and copper hydroxide (Cu(OH)(2)) phases were observed on the surface of as-deposited and 600 degrees C annealed thin films and relative concentrations of these three phases were found to depend on annealing temperature. A complete characterization reported herein allowed us to better understand the surface properties of copper oxide thin films which could then be used as active layers in optoelectronic devices such as solar cells and photodetectors. (C) 2014 Elsevier B.V. All rights reserved.
dc.description.sponsorshipScientific & Technical Research Council of Turkey (TUBITAK) 2218-National Postdoctoral Research Fellowship Program; Distinguished Young Scientists award of the Turkish Academy of Sciences (TUBA)
dc.description.sponsorshipG. A. and F. A. A. would like to give thanks to The Scientific & Technical Research Council of Turkey (TUBITAK) 2218-National Postdoctoral Research Fellowship Program for financial support. H. E. U. acknowledges supports from the Distinguished Young Scientists award of the Turkish Academy of Sciences (TUBA). METU Central Laboratory facilities are also greatly acknowledged.
dc.identifier.doi10.1016/j.matchemphys.2014.06.047
dc.identifier.endpage995
dc.identifier.issn0254-0584
dc.identifier.issn1879-3312
dc.identifier.issue3
dc.identifier.scopus2-s2.0-84905678864
dc.identifier.scopusqualityQ1
dc.identifier.startpage987
dc.identifier.urihttps://dx.doi.org/10.1016/j.matchemphys.2014.06.047
dc.identifier.urihttps://hdl.handle.net/11480/4113
dc.identifier.volume147
dc.identifier.wosWOS:000340975900086
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthor[0-Belirlenecek]
dc.language.isoen
dc.publisherELSEVIER SCIENCE SA
dc.relation.ispartofMATERIALS CHEMISTRY AND PHYSICS
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectThin films
dc.subjectSol-gel growth
dc.subjectX-ray photo-emission spectroscopy (XPS)
dc.subjectElectronic structure
dc.titleInfluence of thermal annealing on microstructural, morphological, optical properties and surface electronic structure of copper oxide thin films
dc.typeArticle

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