Effects of thickness on electronic structure of titanium thin films

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dc.contributor.authorAkgul, Guvenc
dc.date.accessioned2019-08-01T13:38:39Z
dc.date.available2019-08-01T13:38:39Z
dc.date.issued2014
dc.departmentNiğde ÖHÜ
dc.description.abstractEffects of thickness on the electronic structure of e-beam evaporated thin titanium films were studied using near-edge X-ray absorption fine structure (NEXAFS) technique at titanium L-2,L-3 edge in total electron yield (TEY) mode and transmission yield mode. Thickness dependence of L-2,L-3 branching ratio (BR) of titanium was investigated and it was found that BR below 3.5 nm shows a strong dependence on film thickness. Mean electron escape depth (lambda) in titanium, an important parameter for surface applications, was determined to be lambda = 2.6 +/- 0.1 nm using L-2,L-3 resonance intensity variation as a function of film thickness. The average L-3/L-2 white line intensity ratio of titanium was obtained as 0.89 from the ratio of amplitudes of each L-3 and L-2 peaks and 0.66 from the integrated area under each L-3 and L-2 peaks. In addition, a theoretical calculation for pure titanium was presented for comparison with experimental data.
dc.description.sponsorshipDepartment of Energy (DOE), Office of Basic Energy Science
dc.description.sponsorshipThe author is grateful to Profs Piero Pianetta, Herman Winick and staff at the Stanford Synchrotron Radiation Lightsource (SSRL) for their excellent support, where NEXAFS experiments have been carried out. (SSRL) is supported by the Department of Energy (DOE), Office of Basic Energy Science.
dc.identifier.doi10.1007/s12034-014-0623-z
dc.identifier.endpage45
dc.identifier.issn0250-4707
dc.identifier.issn0973-7669
dc.identifier.issue1
dc.identifier.scopus2-s2.0-84899921221
dc.identifier.scopusqualityQ3
dc.identifier.startpage41
dc.identifier.urihttps://dx.doi.org/10.1007/s12034-014-0623-z
dc.identifier.urihttps://hdl.handle.net/11480/4201
dc.identifier.volume37
dc.identifier.wosWOS:000335718100007
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthorAkgul, Guvenc
dc.language.isoen
dc.publisherINDIAN ACAD SCIENCES
dc.relation.ispartofBULLETIN OF MATERIALS SCIENCE
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectNEXAFS
dc.subjecttitanium
dc.subjectbranching ratio
dc.subjectelectron escape depth
dc.subjectthin films
dc.titleEffects of thickness on electronic structure of titanium thin films
dc.typeArticle

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