Thickness dependence of the L-2,L-3 branching ratio of Cr thin films
Küçük Resim Yok
Tarih
2010
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
ELSEVIER SCIENCE SA
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
We report the electronic structure of chromium (Cr) thin films depending on its thickness using two measures, total electron yield (TEY) and transmission yield mode. The Cr L edge X-ray absorption spectroscopy (XAS) spectrum shows strong thickness dependence with broader line widths observed for L-2,L-3 edge peaks for thinner films. The white line ratio (L-3/L-2) was found to be 1.25 from the integrated area under each L-3 and L-2 peak and 1.36 from the ratio of the amplitudes of each L-3 and L-2 peak after the deconvolution. Additionally, we show that full-width at half-maximum (FWHM) at the L-2 and L-3 edges and the branching ratio of Cr change as a function of film thickness and these are discussed in detail. Using L-2,L-3 resonance intensity variation as a function of film thickness we calculated the electron escape depth and X-ray attenuation length in Cr. Comparing our results with the literature, there was good agreement for the L-3-L-2 ratio although the detailed shape can show additional solid state and atomic effects. (c) 2010 Elsevier B.V. All rights reserved.
Açıklama
Anahtar Kelimeler
XANES, Cr, Transmission yield, 3d Transition metals, Branching ratio, Electron Escape depth
Kaynak
JOURNAL OF ALLOYS AND COMPOUNDS
WoS Q Değeri
Q1
Scopus Q Değeri
Q1
Cilt
508
Sayı
2
