Thickness dependence of the L-2,L-3 branching ratio of Cr thin films

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dc.authorid0000-0002-4411-5956
dc.authorid0000-0001-9524-6908
dc.contributor.authorAksoy, F.
dc.contributor.authorAkgul, G.
dc.contributor.authorUfuktepe, Y.
dc.contributor.authorNordlund, D.
dc.date.accessioned2019-08-01T13:38:39Z
dc.date.available2019-08-01T13:38:39Z
dc.date.issued2010
dc.departmentNiğde ÖHÜ
dc.description.abstractWe report the electronic structure of chromium (Cr) thin films depending on its thickness using two measures, total electron yield (TEY) and transmission yield mode. The Cr L edge X-ray absorption spectroscopy (XAS) spectrum shows strong thickness dependence with broader line widths observed for L-2,L-3 edge peaks for thinner films. The white line ratio (L-3/L-2) was found to be 1.25 from the integrated area under each L-3 and L-2 peak and 1.36 from the ratio of the amplitudes of each L-3 and L-2 peak after the deconvolution. Additionally, we show that full-width at half-maximum (FWHM) at the L-2 and L-3 edges and the branching ratio of Cr change as a function of film thickness and these are discussed in detail. Using L-2,L-3 resonance intensity variation as a function of film thickness we calculated the electron escape depth and X-ray attenuation length in Cr. Comparing our results with the literature, there was good agreement for the L-3-L-2 ratio although the detailed shape can show additional solid state and atomic effects. (c) 2010 Elsevier B.V. All rights reserved.
dc.description.sponsorshipDepartment of Energy (DOE), Office of Basic Energy Science; University of Cukurova; DOE
dc.description.sponsorshipThe authors thank Professor Piero Pianetta, Professor Herman Winick and the staff at the Stanford Synchrotron Radiation Laboratory (SSRL) for their excellent support, where the XANES experiments were carried out. SSRL is supported by the Department of Energy (DOE), Office of Basic Energy Science. Y.U. acknowledges financial support by the University of Cukurova and the DOE Cooperative Research Program for the Synchrotron-light for Experimental Science and Applications in the Middle East (SESAME) project. The authors also thank Fred Johnson for editorial assistance with this manuscript.
dc.identifier.doi10.1016/j.jallcom.2010.07.100
dc.identifier.endpage237
dc.identifier.issn0925-8388
dc.identifier.issue2
dc.identifier.scopus2-s2.0-77957870253
dc.identifier.scopusqualityQ1
dc.identifier.startpage233
dc.identifier.urihttps://dx.doi.org/10.1016/j.jallcom.2010.07.100
dc.identifier.urihttps://hdl.handle.net/11480/4829
dc.identifier.volume508
dc.identifier.wosWOS:000283954000008
dc.identifier.wosqualityQ1
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthor[0-Belirlenecek]
dc.language.isoen
dc.publisherELSEVIER SCIENCE SA
dc.relation.ispartofJOURNAL OF ALLOYS AND COMPOUNDS
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectXANES
dc.subjectCr
dc.subjectTransmission yield
dc.subject3d Transition metals
dc.subjectBranching ratio
dc.subjectElectron Escape depth
dc.titleThickness dependence of the L-2,L-3 branching ratio of Cr thin films
dc.typeArticle

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