Patterning of photoresist by micro-holes with controllable physical dimensions via maskless photolithography
Küçük Resim Yok
Tarih
2023
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Natl Inst Optoelectronics
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
Patterning of positive photoresist, coated on glass, with micro-holes via maskless photolithography was the subject of this study. The successful formation of micro-holes with controllable physical parameters on the homogenous photoresist was confirmed by optical microscope and profilometer measurements. Mainly, the effect of modulation and velocity of the laser on the spacing and diameter of micro-holes has been investigated. The comparison of the spacing-to-diameter (s/d) ratio calculated from the pattern with the smallest diameter and highest spacing to the one with the highest diameter and smallest spacing gives the result of 18-fold. For the pattern with the s/d ratio obtained by the lowest modulation and highest velocity, the circular shaped and well-defined micro-holes with 500 nm thickness, 10 mu m diameter and varying spacing from 15 (bottom) to 30 mu m (top) could be obtained successfully.
Açıklama
Anahtar Kelimeler
Maskless photolithography, Positive photoresist, Patterning, Micro-holes, UV-laser
Kaynak
Optoelectronics and Advanced Materials-Rapid Communications
WoS Q Değeri
Q4
Scopus Q Değeri
Q4
Cilt
17
Sayı
5-6
