Patterning of photoresist by micro-holes with controllable physical dimensions via maskless photolithography

Basit Öğe Kaydı
dc.contributor.authorKeles, F.
dc.contributor.authorGucluer, F.
dc.date.accessioned2024-11-07T13:24:23Z
dc.date.available2024-11-07T13:24:23Z
dc.date.issued2023
dc.departmentNiğde Ömer Halisdemir Üniversitesi
dc.description.abstractPatterning of positive photoresist, coated on glass, with micro-holes via maskless photolithography was the subject of this study. The successful formation of micro-holes with controllable physical parameters on the homogenous photoresist was confirmed by optical microscope and profilometer measurements. Mainly, the effect of modulation and velocity of the laser on the spacing and diameter of micro-holes has been investigated. The comparison of the spacing-to-diameter (s/d) ratio calculated from the pattern with the smallest diameter and highest spacing to the one with the highest diameter and smallest spacing gives the result of 18-fold. For the pattern with the s/d ratio obtained by the lowest modulation and highest velocity, the circular shaped and well-defined micro-holes with 500 nm thickness, 10 mu m diameter and varying spacing from 15 (bottom) to 30 mu m (top) could be obtained successfully.
dc.identifier.endpage218
dc.identifier.issn1842-6573
dc.identifier.issn2065-3824
dc.identifier.issue5-6
dc.identifier.scopus2-s2.0-85178910851
dc.identifier.scopusqualityQ4
dc.identifier.startpage214
dc.identifier.urihttps://hdl.handle.net/11480/14062
dc.identifier.volume17
dc.identifier.wosWOS:001032036900006
dc.identifier.wosqualityQ4
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherNatl Inst Optoelectronics
dc.relation.ispartofOptoelectronics and Advanced Materials-Rapid Communications
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_20241106
dc.subjectMaskless photolithography
dc.subjectPositive photoresist
dc.subjectPatterning
dc.subjectMicro-holes
dc.subjectUV-laser
dc.titlePatterning of photoresist by micro-holes with controllable physical dimensions via maskless photolithography
dc.typeArticle

Dosyalar

Koleksiyon

WoS İndeksli Yayınlar Koleksiyonu
Scopus İndeksli Yayınlar Koleksiyonu