Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity
Küçük Resim Yok
Tarih
2019
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Iop Publishing Ltd
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
In this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 mu Omega.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS) respectively, demonstrates good adhesivity and crystalline properties, together with high reflectance. In order to obtain Mo-bilayer with these improved properties, we first determined the optimal growth temperature and pressure parameters by checking the structural and electrical properties respectively of Mo-single layers. As a result, we achieved a deposit of Mo-bilayer thin film that can be used as a good back contact layer in solar cell applications, both in terms of material cost saving and its superior properties, even at such low thickness.
Açıklama
Anahtar Kelimeler
Mo-bilayer, DC sputter, resistivity, growth temperature, HPS, LPS
Kaynak
Materials Research Express
WoS Q Değeri
Q3
Scopus Q Değeri
Q2
Cilt
6
Sayı
12
