Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity

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dc.authoridKeles, Filiz/0000-0003-4548-489X
dc.authoridSeyhan, Ayse/0000-0001-8090-1404
dc.contributor.authorKeles, Filiz
dc.contributor.authorAtasoy, Yavuz
dc.contributor.authorSeyhan, Ayse
dc.date.accessioned2024-11-07T13:24:26Z
dc.date.available2024-11-07T13:24:26Z
dc.date.issued2019
dc.departmentNiğde Ömer Halisdemir Üniversitesi
dc.description.abstractIn this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 mu Omega.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS) respectively, demonstrates good adhesivity and crystalline properties, together with high reflectance. In order to obtain Mo-bilayer with these improved properties, we first determined the optimal growth temperature and pressure parameters by checking the structural and electrical properties respectively of Mo-single layers. As a result, we achieved a deposit of Mo-bilayer thin film that can be used as a good back contact layer in solar cell applications, both in terms of material cost saving and its superior properties, even at such low thickness.
dc.description.sponsorshipRepublic of Turkey Ministry of Development [DPT010K121260]
dc.description.sponsorshipThis work was partly supported by Republic of Turkey Ministry of Development (grant no: DPT010K121260). The authors would like to thank Bilkent UniversityUNAMcenter for helping with SEM imaging and Drs. Omer Faruk Yuksel and Ummuhan Akin from Selcuk University for the reflectance measurement.
dc.identifier.doi10.1088/2053-1591/ab6f33
dc.identifier.issn2053-1591
dc.identifier.issue12
dc.identifier.scopus2-s2.0-85081698966
dc.identifier.scopusqualityQ2
dc.identifier.urihttps://doi.org/10.1088/2053-1591/ab6f33
dc.identifier.urihttps://hdl.handle.net/11480/14113
dc.identifier.volume6
dc.identifier.wosWOS:000516860600022
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherIop Publishing Ltd
dc.relation.ispartofMaterials Research Express
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/openAccess
dc.snmzKA_20241106
dc.subjectMo-bilayer
dc.subjectDC sputter
dc.subjectresistivity
dc.subjectgrowth temperature
dc.subjectHPS
dc.subjectLPS
dc.titleSputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity
dc.typeArticle

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